28亿一台，全球首台High-NA EUV光刻机来袭，精度突破0.7nm

与非网12-22 13:00

如果说过去十年，半导体竞争的关键词是制程节点，那么从现在开始，真正的关键词只剩下两个字：光刻。就在不久前，英特尔正式确认——全球首台商用 High-NA EUV 光刻机，已经安装完成，并通过验收。它的名字不算好记：ASML Twinscan EXE:5200B。但它的价格，全行业都记得住：单台售价超过 3.8 亿美元，折合人民币接近 28 亿元。过去几年，全球先进制程一直卡在一个现实问题上：Low...

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href=http://gu.qq.com/resources/shy/news/detail-v2/index.html#/?id=nesSN20251222131002a6bfdef9&s=b><strong>与非网</strong></a>\n\n\n</h4>\n\n</header>\n<article>\n<div>\n<p>如果说过去十年，半导体竞争的关键词是制程节点，那么从现在开始，真正的关键词只剩下两个字：光刻。就在不久前，英特尔正式确认——全球首台商用 High-NA EUV 光刻机，已经安装完成，并通过验收。它的名字不算好记：ASML Twinscan EXE:5200B。但它的价格，全行业都记得住：单台售价超过 3.8 亿美元，折合人民币接近 28 亿元。过去几年，全球先进制程一直卡在一个现实问题上：Low...</p>\n\n<a 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EUV，关键层不再依赖复杂多重曝光，设计规则更灵活、掩模更少、周期更短。对英特尔来说，这不是一次技术尝试，而是一场押注未来十年的豪赌。而 EXE:5200B 的到位，意味着这场赌局，已经正式开牌。很多人容易忽略一句话：套刻精度，比分辨率更难。分辨率，是“能不能画出来”；套刻精度，是“能不能一层层对齐”。在 1nm 级工艺中：晶圆轻微热胀冷缩，光刻胶微小形变，设备长时间运行漂移。都会直接导致线路错位、短路、断路。EXE:5200B 能做到 0.7nm，靠的不是单点突破，而是一整套系统工程：更强 EUV 光源，更高稳定性的光学系统，全新晶圆存储与温控架构，更严苛的环境隔离与传感器校准。说得直白点：这已经不是一台机器，而是一整座精密工厂。一台 28 亿人民币的设备，值不值？英特尔的逻辑很清楚：曝光次数更少、掩模数量下降、流程更短、良率更可控。最终换来的不是省钱，而是先进节点的可持续性。在 1nm 以下时代，真正贵的不是设备，而是失败一次的代价。这不是英特尔的胜利，而是科技战升级。这台 28 亿的光刻机，并不能保证英特尔一定成功。但它至少说明了一件事：先进制程的天花板，还没封死。真正残酷的竞争，才刚刚开始。","kind":"news","is_publish_news":true,"is_publish_highlight":false,"is_publish_live":false,"is_publish_wemedia":null,"editions":null,"column":"","sentiment":"1","news_tag":"productRelease","news_rank":0,"symbols":[],"gpt_button":0,"need_auth":false,"code":"91000000","status":"200"},"commentList":[],"isCommentEnd":true,"newsSizeData":{"likeSize":0,"commentSize":0,"repostSize":0,"favoriteSize":0,"likeStatus":false,"favoriteStatus":false},"APP":{"userAgent":"Mozilla/5.0 AppleWebKit/537.36 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28亿一台， 全球首台High-NA EUV光刻机来袭，精度突破0.7nm

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28亿一台，全球首台High-NA EUV光刻机来袭，精度突破0.7nm