英特尔官宣两项两项关键技术里程碑

微电子制造12-19

日前，英特尔晶圆代工业务部（Intel Foundry）宣布两项重要技术里程碑，分别聚焦高数值孔径（High NA）极紫外（EUV）光刻技术落地与二维材料晶体管集成突破。首台TWINSCAN EXE:5200B高NA EUV光刻机完成验收测试英特尔表示，与ASML合作验证了TWINSCAN EXE:5200B High NA EUV光刻机的技术可行性，其在精度与产能上的突破为高 NA EUV 技术...

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