ASML CEO：High NA EUV光刻机2027~2028年用于先进制程量产

DoNews2025-12-15

ASML CEOChristophe Fouquet 在公司总部接受彭博社专访时表示，预计 High NA EUV 光刻机将于 2027 至 2028 年正式投入先进制程的大规模量产。目前在导入新一代图案化技术方面最积极的是英特尔代工，其支持 High NA EUV 的 Intel 14A 节点计划于 2027 年正式推出。Fouquet 指出，High NA EUV 光刻机正由英特尔等客户进行...

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