台积电自研EUV光罩保护膜推迟导入High-NA EUV光刻机

芯智讯10-24

10月22日消息，光罩大厂Tekscend Photomask（科盛德光罩）近日于日本东京证交所挂牌上市，募资规模达1,566亿元日元。而随着Tekscend Photomask的上市，象征着半导体产业前进至埃米制程，扮演最前端制程的光罩重要性大大增加。供应链指出，光罩好比芯片制作的底片，光罩受污染会导致无法提升最终良率。因此，台积电自研光罩保护膜（Pellicle），主要因为2nm以下光罩...

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href=http://gu.qq.com/resources/shy/news/detail-v2/index.html#/?id=nesSN2025102409482194daa2c3&s=b><strong>芯智讯</strong></a>\n\n\n</h4>\n\n</header>\n<article>\n<div>\n<p>10月22日消息，光罩大厂Tekscend Photomask（科盛德光罩）近日于日本东京证交所挂牌上市，募资规模达1,566亿元日元。而随着Tekscend Photomask的上市，象征着半导体产业前进至埃米制程，扮演最前端制程的光罩重要性大大增加。供应链指出，光罩好比芯片制作的底片，光罩受污染会导致无法提升最终良率。因此，台积电自研光罩保护膜（Pellicle），主要因为2nm以下光罩...</p>\n\n<a href=\"http://gu.qq.com/resources/shy/news/detail-v2/index.html#/?id=nesSN2025102409482194daa2c3&s=b\">网页链接</a>\n\n</div>\n\n\n</article>\n</div>\n</body>\n</html>\n","isBrief":false,"type":0,"news_type":1,"symbol":"LU1211504680.USD","symbol_name":"ALLIANZ HIGH DIVIDEND ASIA PACIFIC EQUITY \"AM\" (USD) 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EUV光刻机，可以直接降低折旧压力。光罩保护膜用于防尘，有助提升EUV生产效率。不过，膜厚设计将对微影制程的曝光波长造成影响，因此透光度及材料选择将至关重要。据悉，现阶段不管是相关镀膜材料及设备均由国外大厂供应，而台厂当中，天虹则从光罩护膜检测设备切入。因此，相关设备、耗材等供应链也有望迎来新契机。随着光罩外包比重将提高，其中Tekscend的EUV光罩营收占比目标，将从2024年之35%提升至2028年的55%。相比之下，台企台湾光罩将锁定成熟制程，将有外溢效果。此外，光罩盒提供光罩运输与储存时安全防护、避免静电损害，台企家登精密也有望因此受益。","kind":"news","is_publish_news":true,"is_publish_highlight":false,"is_publish_live":false,"is_publish_wemedia":null,"editions":null,"column":"","sentiment":"-1","news_tag":"","news_rank":0,"symbols":[],"gpt_button":0,"need_auth":false,"code":"91000000","status":"200"},"commentList":[],"isCommentEnd":true,"newsSizeData":{"likeSize":0,"commentSize":0,"repostSize":0,"favoriteSize":0,"likeStatus":false,"favoriteStatus":false},"APP":{"userAgent":"Mozilla/5.0 AppleWebKit/537.36 (KHTML, like Gecko; compatible; ClaudeBot/1.0; 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台积电自研EUV光罩保护膜 推迟导入High-NA EUV光刻机

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台积电自研EUV光罩保护膜推迟导入High-NA EUV光刻机