三星电子斥资1.1万亿韩元引进High-NA EUV光刻机

环球网10-16

【环球网科技综合报道】10月16日消息，据KED Global报道，三星电子宣布一项重大投资计划，将投入约1.1万亿韩元引进两台最新的High-NA双级极紫外（EUV）光刻机，此举标志着该企业在下一代半导体芯片量产领域迈出关键一步。据业内人士披露，三星电子此前仅在京畿道园区部署过一台High-NA EUV设备，且主要用于研发环节。此次引进的两台设备则聚焦“产品量产”，是该企业首次将此类先进设备应用...

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