国林科技：臭氧是支撑半导体制造工艺的重要技术要素之一

互动易08-11

有投资者向国林科技提问，请问公司的半导体臭氧设备产生的臭氧，是否在半导体制造中贯穿“清洗-沉积-刻蚀-保护”全流程？同时它是支撑先进制程（如5nm/3nm芯片、Mini-LED、化合物半导体）的核心技术要素吗？公司回答表示，尊敬的投资者，您好。臭氧在半导体行业的应用范围主要包括化学气相沉积、原子层薄膜沉积、晶圆清洗、污染物及光刻胶去除、表面处理、氧化物生成等工艺制程，目前被广泛应用于电子工业中，...

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