泰晶科技股份有限公司一种PVD掩膜结构及工艺专利公布（半导体制造专利快讯）

DoNews2025-07-30

天眼查App显示，2025年7月29日，“一种PVD掩膜结构及工艺”正式进入专利的公布阶段。申请人为泰晶科技股份有限公司，该项半导体制造专利涉及PVD（物理气相沉积）工艺中的掩膜结构设计及其应用。据专利信息显示，该方案通过将掩膜版与基片间隔分布，并控制掩膜版与基片之间的距离大于镀层厚度，从而避免了镀层边缘与掩膜窗口粘连导致的银屑问题，显著优化了现有PVD工艺的稳定性和成品率。发明人为张威、肖扬文、...

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