阿斯麦(ASML)首席技术官：明年将交付首台High-NA EUV光刻机当前光刻技术或走到尽头

凤凰网港股2022-09-28

据悉，光刻机巨头阿斯麦(ASML)首席技术官Martin van den Brink日前接受采访时表示，目前公司正有序推行其路线图，在EUV之后是High-NA EUV技术。阿斯麦正在准备向客户交付首台High-NA EUV光刻机，大概会在明年某个时间点完成，Martin相信这个目标会实现，尽管供应链问题仍然可能会扰乱这一计划。至于High-NA EUV技术之后的技术方案，Martin表示，阿斯麦正在研究降低波长，但怀疑Hyper-NA将是最后一个NA（NumericalAperture，数值孔径），可能是接下来半导体光刻技术发展出现问题的地方，其制造和使用成本都高得惊人，且不一定能真正投入生产，当前半导体光刻技术之路或已走到尽头。

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阿斯麦(ASML)首席技术官：明年将交付首台High-NA EUV光刻机 当前光刻技术或走到尽头

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阿斯麦(ASML)首席技术官：明年将交付首台High-NA EUV光刻机当前光刻技术或走到尽头